US 8703208
Nanometer mesoporous silica-based xerogel styptic process and its preparing process and application
granted A61PA61P7/04
Quick answer
US patent 8703208 (Nanometer mesoporous silica-based xerogel styptic process and its preparing process and application) held by East China University of Science and Technology expires Mon Apr 17 2034 00:00:00 GMT+0000 (Coordinated Universal Time). Status: granted.
Key facts
- Applicant
- East China University of Science and Technology
- Grant date
- Tue Apr 22 2014 00:00:00 GMT+0000 (Coordinated Universal Time)
- Expiration
- Mon Apr 17 2034 00:00:00 GMT+0000 (Coordinated Universal Time)
- Claims
- 21
- CPC classes
- A61P, A61P7/04